MKP competes with imported equipment with 'Pressure Sensor-based MFC'

Etching·Chemical vapor deposition process application

2019-01-10     Gijong Lee
MKP

MKP with the semiconductor mass flow controller (MFC) as its main product will enter into full-scale competition with foreign companies in the MFC market. It is a strategy to pursue a leading company by developing a pressure sensor-based MFC that can be used in difficult etching processes.

The MARU 9000 series, pressure sensor-based MFC, is suitable for miniaturization of semiconductor processes. It has faster control speed and higher accuracy than conventional thermal MFCs. It can control the mass flow rate desired by the user in the semiconductor process, allowing it to be suitable for the ultrafine process such as etching which requires precise control of minute flow rate.

In the domestic MFC market, the US Pivotal and Japan Horiba are the dominant players. The MARU 9000 series, developed by MKP with its own technology, can be used in the semiconductor manufacturing processes such as chemical vapor deposition (CVD) and metal processing, in addition to the most demanding etching processes in semiconductor processing. MKP products are applied to various processes while being supplied to Samsung Electronics equipment makers.

MKP's existing thermal equipment MARU 7000 series is aimed at the CVD market. In addition to CVD, the MARU 7000 series can be used in ion implantation (IMP), metal, diffusion, and more.

MKP is headquartered in Hwaseong, Gyeonggi Province. Its main products are MFC and mass flow meter (MFM). In 2016, it was separated from MK Precision and has 52 employees. It has entered China and Taiwan markets, and plans to enter the US, Europe, and India in the future. The goal is to become a representative mass flow total solution provider.