"The world's first sub-20nm particle detection equipment company PMS"

The importance of measuring particle contamination in advanced semiconductor processes has increased. Even the smallest amount of pollutants contained in chemical materials, air, gas, and water may have a significant impact on product quality and yield.

The focal point of PMS, a pollution control technology company, is particle detection equipment. Chem-20 and UDI-20, which measure 20-nano-sized particles contained in chemical materials and UPW (Ultra Pure Water), and NPC 10, which detects 10-nano-size particles contained in the air, are the representative products. 

Chem-20, launched in 2016, is a device for detecting particles of 20 nanometers in chemical materials and UPW. PMS is the world's first to commercialize a device that measures 20-nanometer particles in chemical materials. The previously existing product was limited to detecting particles of 30-nanometers and over. Chem-20 finds pollutants in sulfuric acid, hydrochloric acid, hydrogen peroxide, ammonia water, water, hydrofluoric acid, and isopropyl alcohol (IPA), which are bulk chemicals used in wet processes such as etching and cleaning. Chem-20 Hi is for the chemical material with a high refractive index, such as sulfuric acid and hydrochloric acid, and Chem-20 Low is for other types of materials. 

The UDI-20 is specialized for UPW. This equipment can identify particles in UPW that have not been seen with existing products. PMS is also anticipating the NPC 10, which measures 10-nanometer particles in the air.

PMS is planning to develop products and services to measure and manage smaller, more various pollutants. PMS's U.S. headquarters was founded in 1972, and PMS Korea was established in 2014. It has established networks in more than 70 countries around the world.