Auros Technology said on Monday that it was close to winning a new order from China within the month.
A company spokesperson said results remained to be seen but the situation has been positive up to now.
If Auros win the contract, it will be supplying its DRAM production equipment.
Company CEO Lee Jun-woo said at a press conference on the same day that the company plans to expand abroad this year, starting with China then to the US and Europe.
Auros’ main customer so far has been SK Hynix. Last year, up to the third quarter, SK Hynix accounted for 98.7% of its sales.
Besides China, the company is planning to setup an office at Silicon Valley in May. The regional office will be used to secure US customers, such as Intel, and to recruit local talents for research and development.
CEO Lee said the local regional office will be setup faster than expected and that the company will carefully watch the changes in the market in light of the pandemic before entering the US market.
Last year in August, Auros setup a new research center at Pangyo. It will be researching new technology besides overlay, its current main focus.
The company is planning to list on KOSDAQ on February 25. It is planning to use the funds to hire new researchers, launch new products and for research and development. It will spend 7 billion won, 10 billion won and 3 billion won on mass metrology, thin-film metrology and inspection, respectively.
Auros was founded in 2003. It posted 14.5 billion won in sales and 4 billion won in operating income up to the third quarter in 2020. It is offering 1.9 million shares and asking for a 17,000 won to 21,000 won per share price. It will commence its demand forecast from Monday to Tuesday.
Overlay measurement equipment is used to measure whether materials tacked on top of wafers are aligned correctly during semiconductor production. The equipment shoots light and uses the reflected light to check whether they are done correctly. Its competitors are US’ KLA and ASML of the Netherlands. Both Auros and KLC use image based overlay technology. ASML uses diffraction based overlay technology. Image based overlay technology can applied to the all layers in the chip making process, unlike diffraction based overlay. It measures faster and more accurately. KLA is overwhelmingly dominant in the field with over 90% market share.